LSMO Films with Increased Temperature of MI Transition
نویسندگان
چکیده
منابع مشابه
Annealing temperature effect on nanostructure and phase transition of Copper Oxide thin films
This paper addresses the annealing temperature effect on nanostructure and phase transition of copper oxide thin films, deposited by PVD method on glass substrate (at 110 nm thickness) and post annealed at different temperatures (200-400°C) with a flow of 1 cm3s-1 Oxygen. The X-ray diffraction (XRD) was employed for crystallographic and phase analyses, while atomic force m...
متن کاملAnnealing temperature effect on nanostructure and phase transition of Copper Oxide thin films
This paper addresses the annealing temperature effect on nanostructure and phase transition of copper oxide thin films, deposited by PVD method on glass substrate (at 110 nm thickness) and post annealed at different temperatures (200-400°C) with a flow of 1 cm3s-1 Oxygen. The X-ray diffraction (XRD) was employed for crystallographic and phase analyses, while atomic force m...
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متن کاملannealing temperature effect on nanostructure and phase transition of copper oxide thin films
this paper addresses the annealing temperature effect on nanostructure and phase transition of copper oxide thin films, deposited by pvd method on glass substrate (at 110 nm thickness) and post annealed at different temperatures (200-400°c) with a flow of 1 cm3s-1 oxygen. the x-ray diffraction (xrd) was employed for crystallographic and phase analyses, while atomic force microscopy (afm) was us...
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ژورنال
عنوان ژورنال: Acta Physica Polonica A
سال: 2014
ISSN: 0587-4246,1898-794X
DOI: 10.12693/aphyspola.126.212